Aluminum etch (80:15:3:2), CMOS, J.T.Baker®

Supplier: Avantor
Danger


Management of Change (MOC) category = R

5459-05EA 0 INR
5459-05
Aluminum etch (80:15:3:2), CMOS, J.T.Baker®
Aluminum etch
UN: 1760
ADR: 8,II

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Specification Test Results

For Microelectronic Use
Phosphoric Acid (H₃PO₄)(w/w) 72.5 - 74.5 %
Nitric Acid (HNO₃)(w/w) 1.7 - 2.3 %
Acetic Acid (CH₃COOH)(w/w) 9.5 - 10.5 %
Antimony (Sb) ≤15.000 ppm
Calcium (Ca) ≤15 ppm
Chloride (Cl) ≤3 ppm
Sodium (Na) ≤10.000 ppm
Sulfate (SO₄) ≤20 ppm
Insoluble Matter ≤50 ppm
Arsenic (As) ≤0.200 ppm
Trace Impurities - Copper (Cu) ≤1 ppm
Trace Impurities - ACS - Heavy Metals (as Pb) ≤5 ppm
Trace Impurities - Iron (Fe) ≤6.000 ppm
Trace Impurities - Lithium (Li) ≤0.300 ppm
Trace Impurities - Magnesium (Mg) ≤2.000 ppm
Trace Impurities - Manganese (Mn) ≤0.200 ppm
Trace Impurities - Nickel (Ni) ≤1.000 ppm
Trace Impurities - Potassium (K) ≤6.000 ppm
Trace Impurities - Strontium (Sr) ≤2.000 ppm
Particle Count - 1.0 µm and greater ≤25 par/ml
Reported value is the average of all samples counted for this lot number,with no individual sample value exceeding the specification.
NOTE: Bottle will discolor with age.

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