Buffered oxide etch (6:1) VLSI for microelectronic use, with surfactant, J.T.Baker®

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5569-03EA 0 INR
5569-03
Buffered oxide etch (6:1) VLSI for microelectronic use, with surfactant, J.T.Baker®
Buffered oxide etch
UN: 2922
ADR: 8,II

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Specification Test Results

For Microelectronic Use
Ship and store material above 60°F (16°C)
Ammonium Fluoride (NH₄F)(w/w) 33.5 - 35.5 %
Hydrofluoric Acid (HF)(w/w) 7.0 - 7.3 %
Residue after Ignition ≤10 ppm
Trace Impurities - Aluminum (Al) ≤200.0 ppb
Arsenic and Antimony (as As) ≤30.0 ppb
Trace Impurities - Barium (Ba) ≤1000.0 ppb
Trace Impurities - Boron (B) ≤200.0 ppb
Trace Impurities - Cadmium (Cd) ≤500.0 ppb
Trace Impurities - Calcium (Ca) ≤200.0 ppb
Trace Impurities - Chromium (Cr) ≤100.0 ppb
Trace Impurities - Cobalt (Co) ≤500.0 ppb
Trace Impurities - Copper (Cu) ≤100.0 ppb
Trace Impurities - Gallium (Ga) ≤500.0 ppb
Trace Impurities - Germanium (Ge) ≤500.0 ppb
Trace Impurities - Gold (Au) ≤300.0 ppb
Heavy Metals (as Pb) ≤1000.0 ppb
Trace Impurities - Iron (Fe) ≤200.0 ppb
Trace Impurities - Lead (Pb) ≤300.0 ppb
Trace Impurities - Lithium (Li) ≤1000.0 ppb
Trace Impurities - Magnesium (Mg) ≤200.0 ppb
Trace Impurities - Manganese (Mn) ≤200.0 ppb
Trace Impurities - Nickel (Ni) ≤200.0 ppb
Trace Impurities - Potassium (K) ≤300.0 ppb
Trace Impurities - Silver (Ag) ≤500.0 ppb
Trace Impurities - Sodium (Na) ≤300 ppb
Trace Impurities - Strontium (Sr) ≤1000.0 ppb
Trace Impurities - Tin (Sn) ≤300.0 ppb
Trace Impurities - Titanium (Ti) ≤300.0 ppb
Trace Impurities - Zinc (Zn) ≤300.0 ppb
Particle Count - 1.0 µm and greater ≤25 par/ml
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